Section 01
[Introduction] Predictive Maintenance System for Semiconductor CMP Equipment: Practice from Sensors to Intelligent Decision-Making
In semiconductor manufacturing, chemical mechanical planarization (CMP) equipment is a key link in wafer processing. The traditional regular maintenance mode has problems such as low efficiency, waste, or unexpected downtime. This project presents a complete predictive maintenance solution that combines rule engines and random forest models to enable equipment health monitoring, fault prediction, and maintenance recommendation generation. It supports decision-making through a Streamlit visual dashboard to address industry pain points.